The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.2 Carbon-based thin films

[21p-232-1~18] 6.2 Carbon-based thin films

Fri. Sep 21, 2018 1:15 PM - 6:00 PM 232 (232)

Norio Tokuda(Kanazawa Univ.), Mariko Suzuki(CORNES Technologies Ltd.), Daisuke Takeuchi(AIST), Hisao Miyazaki(Toshiba)

3:45 PM - 4:00 PM

[21p-232-10] 3.8 W/mm Output Power Density at 1 GHz by 2DHG Diamond MOSFETs

〇(B)Ken Kudara1, Shoichiro Imanishi1, Nobutaka Oi1, Satoshi Okubo1, Kiyotaka Horikawa1, Taisuke Kageura1, Atsushi Hiraiwa1, Hiroshi Kawarada1,2 (1.Waseda Univ., 2.Waseda ZAIKEN)

Keywords:diamond, high-frequency, Field Effect Transistor

Semiconductor diamond has excellent material properties, such as high breakdown field, high saturated velocity and high thermal conductivity. Therefore, diamond is a promising semiconductor, particularly as high-frequency and high-power devices. In previous research, although the power performance of conventional high frequency diamond FETs is higher than that of GaAs FETs and LDMOS, it has been generally valuated as low as 20 V because of low breakdown voltage. In this work, we fabricated ALD-Al2O3 2DHG diamond MOSFETs with excellent breakdown voltage and evaluated small signal and large signal performance at high voltage (30 V ≤ |VDS| ≤ 80 V). As a result, the highest output power density 3.8 W/mm is obtained in diamond FETs.