The 79th JSAP Autumn Meeting, 2018

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Poster presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Sep 21, 2018 1:30 PM - 3:30 PM PB (Shirotori Hall)

1:30 PM - 3:30 PM

[21p-PB1-11] Layer-Controlled Grown of MoS2 by CVD and Dependence of Hydrogen Post-Plasma Treatment on S/Mo Ratio

〇Masahiro Sugiyama1, Akihisa Ogino1,2 (1.Shizuoka Univ., 2.Shizuoka Univ.)

Keywords:Microwave Hydrogen Plasma Treatment, Molybdenum Disulfide