[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[21p-PB1-2] Formation of High-Mobility IGZO Thin Film Transistors with Plasma Enhanced Reactive Sputter Deposition (III)

〇Kosuke Takenaka¹, Masashi Endo¹, Tomoki Yoshitani¹, Giichiro Uchida¹, Akinori Ebe², Yuichi Setsuhara¹ (1.Osaka Univ., 2.EMD Corp.)

Keywords:Sputtering, Functional thin films