[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[21p-PB1-5] Behavior of nitrogen species in high power impulse magnetron sputtering

〇Masayuki Nakamura¹, Takayuki Ohta¹, Keigo Takeda¹ (1.Meijo Univ.)

Keywords:high power impulse magnetron sputtering, nitrogen species

In high power impulse magnetron sputtering(HiPIMS),which can realize high ionization rate and produce high energy ion, HiPIMS plasma is measured with optical emission spectroscopy and process of nitrogen species(atom, molecular) will be discussed. With increasing N₂/(N₂+Ar), emission intensity of N atom increased.On the other hand, the emission intensity of Ar and Ti⁺ decreased.It is considered that the plasma density decreased.