[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[21p-PB1-9] Infrared Spectroscopy of Deposition Process of Amorphous Carbon Film during Ethylene Plasma, Compared with during Other Hydrocarbon Plasmas

〇Masanori Shinohara¹, Taisuke Tominaga¹, Hayato Shimomura¹, Takeshi Ihara¹, Yoshihito Yagyu¹, Tamiko Ohshima¹, Hiroharu Kawasaki¹ (1.NIT, Sasebo College)

Keywords:MIR-IRAS, Ethylene, deposition process

Sp³-hydrocarbon components were formed during ethylene plasma on the substrate in the floating potential. According to the previous report, C2H3 are generated in ethylene plasma. It is suggested that C2H3 is altered into sp3-components in the adsorption on the subsatrate. We will present the reaction model during deposition.