Katsumi Okubo

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Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:30 PM - 3:30 PM P8 (P)

Poster presentation
| 13 Semiconductors
| 13.5 Semiconductor devices and related technologies

[17p-P8-1~24] 13.5 Semiconductor devices and related technologies

1:30 PM - 3:30 PM

[17p-P8-6] Static characteristic evaluation of low-temperature deposition process for SiGeHEMT by Sputter Epitaxy Method

〇Katsumi Okubo¹, Yosuke Aoyagi¹, Motohashi Akira¹, Degura Kyouhei¹, Hirose Nobumitsu², Kasamatsu Akifumi², Matsui Toshiaki², Tsukamoto Takahiro¹, Suda Yoshiyuki¹ (1.Tokyo Univ. of Agric. & Technol., 2.National Inst. of Information and Communications Technol)

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