Hirotsugu Sugiura

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Speaker, Author, Co-Author

Tue. Mar 20, 2018 9:00 AM - 12:15 PM C204 (52-204)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-C204-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:45 AM - 11:00 AM

△ [20a-C204-7] The effect of intermittent hydrogen plasma treatment on bonding structure of amorphous carbon film grown by radical injection-PECVD

〇(DC)Hirotsugu Sugiura¹, Hiroki Kondo¹, Kenji Ishikawa¹, Takayoshi Tsutsumi¹, Keigo Takeda², Makoto Sekine¹, Masaru Hori³ (1.Nagoya Univ. Eng., 2.Meijo Univ., 3.Nagoya Univ. Inst. of Innovation for Future Society)

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