Shinji Migita

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Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:45 PM - 6:15 PM F206 (61-206)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[17p-F206-1~17] 13.3 Insulator technology

4:45 PM - 5:00 PM

[17p-F206-12] Formation of Si-doped HfO₂ Ferroelectric Thin Films using Ion Implantation

〇Shinji Migita¹, Hiroyuki Ota¹, Hiroyuki Yamada¹, Keisuke Shibuya¹, Akihito Sawa¹, Takashi Matsukawa¹, Akira Toriumi² (1.AIST, 2.Univ. of Tokyo)