Kiyotaka Horikawa

→ Search for Kiyotaka Horikawa in Google Scholar

Speaker, Author, Co-Author

Sat. Mar 17, 2018 9:00 AM - 12:30 PM F206 (61-206)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[17a-F206-1~13] 13.3 Insulator technology

11:45 AM - 12:00 PM

△ [17a-F206-11] Optimized post-deposition annealing for improved bias stability of atomic-layer-deposited Al2O3 films

〇Kiyotaka Horikawa¹, Atsushi Hiraiwa^2,4, Satoshi Okubo¹, Taisuke Kageura¹, Hiroshi Kawarada^1,2,3 (1.Waseda Univ., 2.RONLI, Waseda Univ., 3.KMLMST, Waseda Univ., 4.Nagoya Univ.)

▲