Weichen Wen

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Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:45 PM - 6:15 PM F206 (61-206)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[17p-F206-1~17] 13.3 Insulator technology

2:30 PM - 2:45 PM

▲ [17p-F206-4] Evaluation of border-traps in GeO₂/Ge gate stacks grown by thermal oxidation and plasma oxidation

〇(D)Weichen Wen¹, Taisei Sakaguchi¹, keisuke Yamamoto¹, Dong Wang¹, Hiroshi Nakashima² (1.IGSES, Kyushu Univ., 2.GIC, Kyushu Univ.)