Shotaro Wachi

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Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:45 PM - 6:15 PM F206 (61-206)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[17p-F206-1~17] 13.3 Insulator technology

3:00 PM - 3:15 PM

[17p-F206-6] Infulence by the High-k layer to give GeO₂/Ge interface characteristics

〇Shotaro Wachi¹, Yoshitaka Iwasaki¹, Tomo Ueno¹, Yoshinori Kitahara¹, Koji Yamada¹, Mitaro Namiki¹ (1.Tokyo Univ. of Agri.&Tech)