Tetsuaki Okada

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Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:45 PM - 5:30 PM F214 (61-214)

Oral presentation
| 15 Crystal Engineering
| 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[17p-F214-1~14] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

2:45 PM - 3:00 PM

[17p-F214-5] GaP Heteroepitaxy on Si (100) Substrate by MOVPE: Effect of process parameters on Si surface reconstruction process

〇Tetsuaki Okada¹, Kim Boram¹, Oliver Supplie², Agnieszka Pasazuk², Thomas Hannappel², Yoshiaki Nakano¹, Masakazu Sugiyama¹ (1.Univ. Tokyo, 2.TU Ilmenau)

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