Reo Kometani

→ Search for Reo Kometani in Google Scholar

Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:30 PM - 3:30 PM P7 (P)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17p-P7-1~21] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

1:30 PM - 3:30 PM

[17p-P7-1] Evaluation of the process characteristics of aluminum-assisted chemical vapor etching

〇Reo Kometani^1,2, Masato Okuno², Shin-ichi Warisawa^1,2 (1.Grad. Sch. of Front. Sci., Univ. of Tokyo, 2.Grad. Sch. of Eng., Univ. of Tokyo)