Yosuke Aoyagi

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Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:30 PM - 3:30 PM P7 (P)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17p-P7-1~21] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

1:30 PM - 3:30 PM

[17p-P7-2] Completely compressively strained SiGe thin film formation technique using Sputter Epitaxy Method

〇(M1)Yosuke Aoyagi¹, Akira Motohashi¹, Kyohei Degura¹, Katsumi Okubo¹, Nobumitsu Hirose², Akifumi Kasamatsu², Toshiaki Matsui², Takahiro Tsukamoto¹, Yoshiyuki Suda¹ (1.Tokyo Univ. of Agric. & technol., 2.National Inst. of Inf. and Commun. Technol.)

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