Misaki Nishi

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Speaker, Author, Co-Author

Sun. Mar 18, 2018 1:45 PM - 5:15 PM E201 (57-201)

Oral presentation
| 21 Joint Session K
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[18p-E201-1~13] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

2:15 PM - 2:30 PM

△ [18p-E201-3] Reaction mechanism analysis for fabricating high quality metal oxide thin film
by Fine Channel type Mist CVD(Ⅱ)

〇(M1)Misaki Nishi¹, Li Liu¹, Syota Sato¹, Phimolphan Rutthongja¹, Masahito Sakamoto¹, Mariko Ueda¹, Pradeep Ellawala.K.C², Dang Giang Thai², Toshiyuki Kawaharamura^2,1 (1.Kochi Univ. of Tech, 2.Res.Inst.,Kochi Univ. of Tech)