Keisuke Yasuta

→ Search for Keisuke Yasuta in Google Scholar

Speaker, Author, Co-Author

Mon. Mar 19, 2018 9:15 AM - 11:45 AM C101 (52-101)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[19a-C101-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

10:45 AM - 11:00 AM

▲ [19a-C101-7] Ar+ ion implantation used to reduce temperature for activating B atoms implanted in silicon

〇Keisuke Yasuta¹, Takuma Uehara¹, Masahiko Hasumi¹, Tomokazu Nagao², Yutaka Inouchi², Toshiyuki Sameshima¹ (1.TUAT, 2.NISSIN ION EQUIPMENT Co.)