Naoki Takeda

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Speaker, Author, Co-Author

Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:30 PM - 4:45 PM

△ [19p-C204-11] Temporal variation of Ar metastable density in pulse modulated inductively coupled plasma and its impact on the VUV/UV radiation-induced damage

〇Naoki Takeda¹, Yasufumi Miyoshi², Kenji Ishikawa¹, Takayoshi Tsutsumi¹, Keigo Takeda³, Takayuki Ohta³, Hiroki Kondo¹, Masanaga Fukasawa², Tetsuya Tatsumi², Masaru Hori¹ (1.Nagoya Univ., 2.Sony Semiconductor Solutions Corp., 3.Meijo Univ.)

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