Toshio Hayashi

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Speaker, Author, Co-Author

Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:30 PM - 3:45 PM

[19p-C204-8] Electronic properties and dissociation channels of C₂H_xF_y compounds (I)

〇Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ. Plasma nano Technology Center)

3:45 PM - 4:00 PM

[19p-C204-9] Electronic properties and dissociation channels of C₂H_xF_y compounds(II)

〇Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ. Plasma nano Technology Center)