Keisuke Kurashima

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Speaker, Author, Co-Author

Mon. Mar 19, 2018 1:30 PM - 6:00 PM D103 (56-103)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[19p-D103-1~17] 15.6 Group IV Compound Semiconductors (SiC)

2:30 PM - 2:45 PM

[19p-D103-5] SiC Epitaxial Reactor Repetitive Cleaning Using ClF₃ Gas and Pyrolytic Carbon-Coated Susceptor

〇Keisuke Kurashima¹, Hitoshi Habuka¹, Hideki Ito², Shinichi Mitani², Yoshinao Takahashi³ (1.Yokohama Nat. Univ., 2.NuFlare Technologies, 3.Kanto Denka Kogyo)