Yoshiki Iizawa

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Speaker, Author, Co-Author

Mon. Mar 19, 2018 1:30 PM - 3:30 PM P4 (P)

Poster presentation
| 6 Thin Films and Surfaces
| 6.2 Carbon-based thin films

[19p-P4-1~15] 6.2 Carbon-based thin films

1:30 PM - 3:30 PM

[19p-P4-4] Fabrication and structural analysis of high-nitrogen containing a-CNx:H thin films using radio-frequency plasma CVD of the organic compound-N₂-Ar gas mixtures

〇Yoshiki Iizawa¹, Hidetoshi Saitoh¹, Haruhiko Ito¹ (1.Nagaoka Univ. of Tech)