Oral presentation

6 Thin Films and Surfaces » 6.6 Probe Microscopy

[18a-F210-1~13] 6.6 Probe Microscopy

6.6と12.2のコードシェアセッションあり

Sun. Mar 18, 2018 9:00 AM - 12:30 PM F210 (61-210)

Satoshi Katano(Tohoku Univ.)

△：奨励賞エントリー
▲：英語発表
▼：奨励賞エントリーかつ英語発表
空欄：どちらもなし

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9:00 AM - 9:15 AM

[18a-F210-1] [The 2nd Thin Film and Surface Physics Division Award Speech] Dissolution Processes at Step Edges of Calcitein Water Investigated by High-Speed Frequency Modulation Atomic Force Microscopy andSimulation

〇Kazuki Miyata¹, John Tracey², Keisuke Miyazawa¹, Ville Haapasilta², Peter Spijker², Yuta Kawagoe¹, Adam S. Foster^1,2, Katsuo Tsukamoto³, Takeshi Fukuma^1,4 (1.Kanazawa Univ., 2.Aalto Univ., 3.Tohoku Univ., 4.ACT-C/JST)

9:15 AM - 9:30 AM

△ [18a-F210-2] Fine processing of acrylic resin film by irradiating localized He/O₂ atmospheric pressure plasma jet using a probe microscope with a nanopipette.

〇Sho Yamamoto¹, Daisuke Morimatsu¹, Atsushi Nakamura¹, Akihisa Ogino¹, Masaaki Nagatsu², Futoshi Iwata^1,2 (1.Graduate school of Integral Science and Technology, Shizuoka Univ., 2.Research Inst. of Electronics, Shizuoka Univ.)

9:30 AM - 9:45 AM

△ [18a-F210-3] Graphene-assisted Chemical Etching of Ge Surfaces in Water
~In situ AFM Observations of the Etching Process~

〇(M1)Shaoxian Li¹, Tomoki Hirano¹, Kentaro Kawai¹, Kazuya Yamamura¹, Kenta Arima¹ (1.Osaka Univ.)

9:45 AM - 10:00 AM

△ [18a-F210-4] Observation of an n^- layer of Si fast recovery diode by Kelvin probe force microscopy

〇(D)Takeshi Uruma¹, Nobuo Satoh², Hidekazu Yamamoto², Futoshi Iwata¹ (1.Graduate School of Sci. and Tech., Shizuoka Univ., 2.Chiba. Ins. of Tech.)

10:00 AM - 10:15 AM

△ [18a-F210-5] Quantitativity of KPFM Using Higher Order Resonance Frequency

〇(PC)Akinori Honda¹, Hiroshi Itoh¹ (1.AIST)

10:15 AM - 10:30 AM

△ [18a-F210-6] STS/UPS study on organic molecule 2D nanostructures on Cu(111)

〇Ryohei Nemoto¹, Eiichi Inami¹, Satoshi Kera², Peter Krueger¹, Toyokazu Yamada¹ (1.Chiba Univ, 2.IMS)

10:30 AM - 10:45 AM

△ [18a-F210-7] Atomic resolution imaging of the rutile-TiO₂(110) (1×2) reconstructed surface using non-contact atomic force microscopy

〇Shoki Ojima¹, Daiki Katsube¹, Yuji Miyato¹, Hayato Yamashita^1,2, Satoshi Abo¹, Masayuki Abe¹ (1.Osaka Univ., 2.JST PRESTO)

10:45 AM - 11:00 AM

△ [18a-F210-8] Investigation of charge state on O-rich rutile TiO₂(110) with KPFM

〇(M1)Yuuki Adachi¹, Quanzhen Zhang¹, Huanfei Wen¹, Yoshitaka Naitoh¹, Yanjun Li¹, Yasuhiro Sugawara¹ (1.Osaka Univ.)

11:00 AM - 11:15 AM

▼ [18a-F210-9] Measurement and manipulation of the charge state of adsorbed oxygen adatoms on rutile TiO₂(110)-1 × 1 surface by nc-AFM and KPFM

〇(D)Quanzhen Zhang¹, Huan Fei Wen¹, Yuuki Adachi¹, Yoshitaka Naitoh¹, Yan Jun Li¹, Yasuhiro Sugawara¹ (1.Osaka Univ.)

11:30 AM - 11:45 AM

[18a-F210-10] Investigation of carrier dynamics in organic thin-film transistors by time-resolved Kelvin-probe force microscopy without voltage modulation

〇Kouichi Innami¹, Kei Kobayashi¹, Hirofumi Yamada¹ (1.Dept. of Electronic Sci. & Eng., Kyoto Univ.)

11:45 AM - 12:00 PM

[18a-F210-11] Time-resolved electrostatic force microscope using cantilever oscillation

〇(M1)kentaro Kajimoto¹, Kento Araki¹, Yoichi Otsuka¹, Hiroshi Oyama¹, Takuya Matsumoto¹ (1.Osaka Univ.)

12:00 PM - 12:15 PM

[18a-F210-12] Development of Scanning Microwave Impedance Microscope Using Heterodyne Technique

〇Ryo Izumi¹, Yoshitaka Naitoh¹, Yan Jun Li¹, Yasuhiro Sugawara¹ (1.Osaka Univ.)

12:15 PM - 12:30 PM

[18a-F210-13] High speed FM-KPFM using Direct Sideband

〇(M1)Taisuke Ochi¹, Yoshitaka Naitoh¹, YanJun Li¹, Yasuhiro Sugawara¹ (1.Osaka Univ.)

Session information

[18a-F210-1~13] 6.6 Probe Microscopy

6.6と12.2のコードシェアセッションあり

[18a-F210-1] [The 2nd Thin Film and Surface Physics Division Award Speech] Dissolution Processes at Step Edges of Calcitein Water Investigated by High-Speed Frequency Modulation Atomic Force Microscopy andSimulation

△ [18a-F210-2] Fine processing of acrylic resin film by irradiating localized He/O₂ atmospheric pressure plasma jet using a probe microscope with a nanopipette.

△ [18a-F210-3] Graphene-assisted Chemical Etching of Ge Surfaces in Water
~In situ AFM Observations of the Etching Process~

△ [18a-F210-4] Observation of an n^- layer of Si fast recovery diode by Kelvin probe force microscopy

△ [18a-F210-5] Quantitativity of KPFM Using Higher Order Resonance Frequency

△ [18a-F210-6] STS/UPS study on organic molecule 2D nanostructures on Cu(111)

△ [18a-F210-7] Atomic resolution imaging of the rutile-TiO₂(110) (1×2) reconstructed surface using non-contact atomic force microscopy

△ [18a-F210-8] Investigation of charge state on O-rich rutile TiO₂(110) with KPFM

▼ [18a-F210-9] Measurement and manipulation of the charge state of adsorbed oxygen adatoms on rutile TiO₂(110)-1 × 1 surface by nc-AFM and KPFM

[18a-F210-10] Investigation of carrier dynamics in organic thin-film transistors by time-resolved Kelvin-probe force microscopy without voltage modulation

[18a-F210-11] Time-resolved electrostatic force microscope using cantilever oscillation

[18a-F210-12] Development of Scanning Microwave Impedance Microscope Using Heterodyne Technique

[18a-F210-13] High speed FM-KPFM using Direct Sideband

Authentication

Session information

[18a-F210-1~13] 6.6 Probe Microscopy

6.6と12.2のコードシェアセッションあり

[18a-F210-1] [The 2nd Thin Film and Surface Physics Division Award Speech] Dissolution Processes at Step Edges of Calcitein Water Investigated by High-Speed Frequency Modulation Atomic Force Microscopy andSimulation

△ [18a-F210-2] Fine processing of acrylic resin film by irradiating localized He/O2 atmospheric pressure plasma jet using a probe microscope with a nanopipette.

△ [18a-F210-3] Graphene-assisted Chemical Etching of Ge Surfaces in Water~In situ AFM Observations of the Etching Process~

△ [18a-F210-4] Observation of an n- layer of Si fast recovery diode by Kelvin probe force microscopy

△ [18a-F210-5] Quantitativity of KPFM Using Higher Order Resonance Frequency

△ [18a-F210-6] STS/UPS study on organic molecule 2D nanostructures on Cu(111)

△ [18a-F210-7] Atomic resolution imaging of the rutile-TiO2(110) (1×2) reconstructed surface using non-contact atomic force microscopy

△ [18a-F210-8] Investigation of charge state on O-rich rutile TiO2 (110) with KPFM

▼ [18a-F210-9] Measurement and manipulation of the charge state of adsorbed oxygen adatoms on rutile TiO2(110)-1 × 1 surface by nc-AFM and KPFM

[18a-F210-10] Investigation of carrier dynamics in organic thin-film transistors by time-resolved Kelvin-probe force microscopy without voltage modulation

[18a-F210-11] Time-resolved electrostatic force microscope using cantilever oscillation

[18a-F210-12] Development of Scanning Microwave Impedance Microscope Using Heterodyne Technique

[18a-F210-13] High speed FM-KPFM using Direct Sideband

Authentication

△ [18a-F210-2] Fine processing of acrylic resin film by irradiating localized He/O₂ atmospheric pressure plasma jet using a probe microscope with a nanopipette.

△ [18a-F210-3] Graphene-assisted Chemical Etching of Ge Surfaces in Water
~In situ AFM Observations of the Etching Process~

△ [18a-F210-4] Observation of an n^- layer of Si fast recovery diode by Kelvin probe force microscopy

△ [18a-F210-7] Atomic resolution imaging of the rutile-TiO₂(110) (1×2) reconstructed surface using non-contact atomic force microscopy

△ [18a-F210-8] Investigation of charge state on O-rich rutile TiO₂(110) with KPFM

▼ [18a-F210-9] Measurement and manipulation of the charge state of adsorbed oxygen adatoms on rutile TiO₂(110)-1 × 1 surface by nc-AFM and KPFM