[17a-C101-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

△ [17a-C101-4] Evaluation of Nanostructure in Poly-Si Grain by Raman Spectroscopy (Ⅲ)

〇(B)Nobuaki Mino¹, Ryo Yokogawa^1,3, Takahiro Suzuki¹, Kazuya Takahashi², Kazuhiko Komori², Tamotsu Morimoto², Naomi Sawamoto¹, Atsushi Ogura¹ (1.Meiji Univ., 2.Tokyo Electron Technology Solutions Ltd., 3.JSPS Research Fellow)

Keywords:raman spectroscopy, nanostructure, Poly-Si