The 65h JSAP Spring Meeting, 2018

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[17a-F206-1~13] 13.3 Insulator technology

Sat. Mar 17, 2018 9:00 AM - 12:30 PM F206 (61-206)

Masao Inoue(Renesas), Takanobu Watanabe(Waseda Univ.)

9:15 AM - 9:30 AM

[17a-F206-2] Evaluation of the depth profile of charge density in SiO2 film by C-V measurement in HF solution

〇Yuto Nakazawa1, Ryu Hasunuma1 (1.Tsukuba Univ.)

Keywords:semiconductor