Control of Surface Topography and Molecular Structure in a Porphyrine Derivative Thin Film by Solvent Vapor Annealing Using a Fluorine Based Solvent

Kazutaka Tomita; Nobutaka Shioya; Ryuma Kise; Takafumi Shimoaka; Kazuo Eda; Takeshi Hasegawa

Presentation information

Oral presentation

12 Organic Molecules and Bioelectronics » 12.2 Characterization and Materials Physics

[17p-F104-1~16] 12.2 Characterization and Materials Physics

6.6と12.2のコードシェアセッションあり

Sat. Mar 17, 2018 1:45 PM - 6:15 PM F104 (61-104)

Toyokazu Yamada(Chiba Univ.), Satoshi Kaneko(Titech), Ken Albrecht(TOKYO INSTITUTE of TECHNOLOGY)

5:30 PM - 5:45 PM

△ [17p-F104-14] Control of Surface Topography and Molecular Structure in a Porphyrine Derivative Thin Film by Solvent Vapor Annealing Using a Fluorine Based Solvent

〇Kazutaka Tomita¹, Nobutaka Shioya¹, Ryuma Kise¹, Takafumi Shimoaka¹, Kazuo Eda², Takeshi Hasegawa¹ (1.ICR, Kyoto Univ., 2.Graduate School of Science, Kobe Univ.)

Keywords:porphyrin, solvent vapor annealing, pMAIRS

Solvent vapor annealing is often employed for improving the device performance of organic thin film devices. In the present study, the effect of solvent annealing using a fluorine-based solvent (HCFC-225) on the molecular structure in a ZnTPP spin-coated film is investigated. The annealing treatment induces a high crystallinity thin film of ZnTPP with keeping a continuous topography. This structural change of the film is investigated by the AFM, GIXD and pMAIRS techniques.