[18a-C204-8~8] 8.7 Plasma Electronics Invited Talk

[18a-C204-8] [INVITED] Plasma etching technology of ULSI devices in IoT

〇Masaru Izawa¹, Kazunori Shinoda², Nobuya Miyoshi², Hiroyuki Kobayashi², Kenji Ishikawa³, Masaru Hori³ (1.Hitachi High-Tech, 2.Hitachi R&D, 3.Nagoya Univ.)

Keywords:plasma etching, semiconductor