[18a-P3-1~14] 7 Beam Technology and Nanofabrication（Poster）

[18a-P3-14] New patterning method with Photo-Induced Surface Materials

〇Satoru Ishikawa¹, Mitsuhiro Wada¹, Kazuo Kawaguchi¹, Hitoshi Hamaguchi¹, Keisuke Kuriyama¹ (1.JSR)

Keywords:Photo-induced Surface Control Material, New patterning method, High content inks

Photo-induced surface control material (PISC) which is able to form wettable / repellent patterns on film surface for printing assistance by mild UV exposure has been developed. We introduce the new patterning method with PISC. The patterns of high content inks can be easily formed with high resolution and high asepect ratio.