The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[18p-C102-1~16] 6.3 Oxide electronics

Sun. Mar 18, 2018 1:45 PM - 6:00 PM C102 (52-102)

Yasuhisa Naitoh(AIST), Shoso Shingubara(Kansai Univ.)

2:45 PM - 3:00 PM

[18p-C102-5] Crossover from Deterministic to Stochastic Nature of Resistive Switching in a Tantalum Oxide Thin Film

Yoshifumi Nishi1,2, Stephan Menzel2,3 (1.Toshiba R&D Center, 2.RWTH Aachen Univ., 3.Forschungszentrum Juelich)

Keywords:resistive memory, Weibull distribution

We study the voltage dependece of the statistical distrubition of the SET time of bipolar resistive switching in a tantalum oxide thin film measured in a single cell. It was found that the distributions are described by Weibull distributions and that the Weibull beta sharply decreases from over 2 toward 1 when the amplitude of the SET voltage is lowered. This indicates that while the SET mechanism can be described deterministically at large SET voltages, stochastic nature becomes dominant when the SET voltage is lowered.