Stability of AlO<sub>x</sub> Films by Substrate Cooling

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Sun. Mar 18, 2018 1:45 PM - 5:15 PM E201 (57-201)

Norifumi Fujimura(Osaka Pref. Univ.), Hisao Makino(Kochi Univ. of Tech.)

1:45 PM - 2:00 PM

〇Masashi Senaha¹, Akira Taki¹, Tatsunori Isobe¹, Makoto Arai¹, Junya Kiyota¹ (1.ULVAC, Inc.)

Keywords:dielectric thin film