Silicon Fine Structure Formation at Interface between SiO<sub>2</sub> Layer and Si Substrate by Electron Beam Irradiation at Room Temperature

Presentation information

Poster presentation

6 Thin Films and Surfaces » 6.5 Surface Physics, Vacuum

Sun. Mar 18, 2018 1:30 PM - 3:30 PM P2 (P)

1:30 PM - 3:30 PM

〇Yoshiharu Enta¹, Yusuke Masuda¹, Yosuke Chida¹ (1.Hirosaki Univ.)

Keywords:silicon fine structure, electron beam irradiation, silicon oixde