2018年第65回応用物理学会春季学術講演会

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6 薄膜・表面 » 6.4 薄膜新材料

[19a-C103-1~12] 6.4 薄膜新材料

2018年3月19日(月) 09:00 〜 12:15 C103 (52-103)

遠藤 民生(さがみはら表面研)、鈴木 宗泰(産総研)

09:45 〜 10:00

[19a-C103-4] The Band Structure of The Quasi-One-Dimensional Layered Semiconductor TiS3(001)

Takashi Komesu1、Hemian Yi2、Simeon Gilbert1、Guanhua Hao1、Andrew Yost1、Alexey Lipatov3、Alexander Sinitskii3、Jose Avila2、Chaoyu Chen2、Maria Asensio2、Peter Dowben1 (1.U. of Nebraska Phsy.、2.SOLEIL、3.U. of Nebraska Chem.)

キーワード:nano-spot angle resolved photoemission、trichalcogenide、electronic band structure

Two dimensional (2D) materials are attractive choices for field effect transistor channels because of the reduced source-drain “cross-talk” at very small spatial dimensions, that occurs because such materials are so thin.1 To date, experimental studies have mostly focused on graphene and the transition metal dichalcogenide (TMDC) materials with MX2 composition (M = Mo, W; X is a chalcogen), such as MoS2, MoSe2, WS2, and WSe2. The disadvantage with such materials is that in scaling down to 10 nm widths or less, edge scattering will become significant. Concern about edge scattering has attracted the attention of theorists2–7 and is now seen to be a major influence in experiment.8–11 To overcome this complication, the transition metal trichalcogenide (TMTC) family are attractive materials. In this talk, we will present the first experimental mapping of the electronic band structure of TiS3, which expected to have a band gap of about 1 eV and a mobility higher than 10,000 cm2/(V*sec).
The experimental mapping of the band structure of TiS3(001), by momentum resolution nano-spot angle resolved photoemission (nano-ARPES), is presented in Figure 1. The experimental band structure, derived from angle-resolved photoemission, confirms that the top of the valence band is at the center of the Brillouin zone. This trichalcogenide has a rectangular surface Brillouin zone where the effective hole mass along the chain direction is -0.95 ± 0.09 me while perpendicular to the chain direction the magnitude of the effective hole mass is much lower at -0.44 ± 0.1 me. The placement of the valence band well below the Fermi level suggests that this is an n-type semiconductor.