[19a-C201-1~11] 8.3 Plasma nanotechnology

[19a-C201-5] Low damage Radical Nitiridation of Silicon with Gold Nanoparticle catalyst on Surface

〇Takeshi Kitajima¹, Kodai Ishida¹, Toshiki Nakano¹ (1.Nat. Def. Acad.)

Keywords:Nanoparticle, plasma, ultra thin film

Catalysis of gold nanoparticles is utilized for low temperature low damage nitridation of silicon substrate by radical enhanced surface chemistry. Plasma supplied radicals are filtered by a SUS mesh electrode to reduce the damage induced by impinging ions. XPS analysis shows Si-N bonding is only possible with gold nanoparticles on the surface.