The 65h JSAP Spring Meeting, 2018

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8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)

Hisataka Hayashi(TOSHIBA), Yoshihide Kihara(Tokyo Electron Miyagi Limited)

4:00 PM - 4:15 PM

[19p-C204-10] Effect of Oxidative Modification on Spin On Glass Film using Microwave Excited Bubble Plasma in Water

〇Sachiko Fujisawa1, Masakuni Ikagawa2, Nobuaki Makino2 (1.Toshiba Materials Co., Ltd, 2.Toshiba Corp.)

Keywords:Plasma, Surface modification