[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [19p-C204-11] Temporal variation of Ar metastable density in pulse modulated inductively coupled plasma and its impact on the VUV/UV radiation-induced damage

〇Naoki Takeda¹, Yasufumi Miyoshi², Kenji Ishikawa¹, Takayoshi Tsutsumi¹, Keigo Takeda³, Takayuki Ohta³, Hiroki Kondo¹, Masanaga Fukasawa², Tetsuya Tatsumi², Masaru Hori¹ (1.Nagoya Univ., 2.Sony Semiconductor Solutions Corp., 3.Meijo Univ.)

Keywords:Ar metastable, pulse modulated plasma

プラズマエッチングプラズマにおける準安定 Ar 励起種(メタステーブル Ar 4s2)の密度を計測し，パルス変調プラズマにおけるプラズマ光発生に与える影響について考察した。