2:15 PM - 2:30 PM
[19p-C204-3] Effects of Low Energy Ar+ Ion Irradiation on Hexafluoroacetylacetone (hfac) Adsorbed Ni and Cu Surfaces
Keywords:atomic layer etching, magnetic material
Presentation information
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)
Hisataka Hayashi(TOSHIBA), Yoshihide Kihara(Tokyo Electron Miyagi Limited)