The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[19p-D103-1~17] 15.6 Group IV Compound Semiconductors (SiC)

Mon. Mar 19, 2018 1:30 PM - 6:00 PM D103 (56-103)

Toshiyuki Isshiki(Kyoto Inst. Tech.), Johji Nishio(Toshiba)

5:45 PM - 6:00 PM

[19p-D103-17] Influence of N Codoping on Resistivity in Heavily Al-doped p-type 4H-SiC

Atsuki Hidaka1, Akinobu Takeshita1, Tatsuya Imamura1, Kota Takano1, Kazuya Okuda1, Hideharu Matsuura1, Shiyang Ji2, Kazuma Eto2, Kazutoshi Kojima2, Tomohisa Kato2, Sadafumi Yoshida2, Hajime Okumura2 (1.OECU, 2.AIST)

Keywords:p-type 4H-SiC, Temperature-dependent resistivity, Conduction mechanism

To realize SiC n-channel insulated gate bipolar transistors (IGBTs) with very low on-resistance, it is required to reduce the resistance in thick p+-type SiC substrate that is a collector of n-channel IGBTs and to obtain high quality crystal. It is reported that codoping of Al and N in heavily Al-doped p-type 4H-SiC can form high quality epilayers. In this study, electrical properties of Al-N codoped p-type 4H-SiC epilayers are investigated. It is found that the codoping of N makes nearest-neighbor hopping conduction dominant at temperatures higher in the singly-doped samples.