2018年第65回応用物理学会春季学術講演会

講演情報

シンポジウム(口頭講演)

シンポジウム » ゲルマニウムはシリコンを代替するのか?

[19p-G203-1~7] ゲルマニウムはシリコンを代替するのか?

2018年3月19日(月) 13:30 〜 17:10 G203 (63-203)

入沢 寿史(産総研)、手塚 勉(東芝)、遠藤 和彦(産総研)

13:30 〜 14:00

[19p-G203-1] Why don’t you enjoy Ge CMOS more?

Akira Toriumi1 (1.Univ. Tokyo)

キーワード:Germanium, CMOS

Ge used to be intensively investigated before 1960. Why Ge was beaten by Si? There were a couple of reasons in terms of (i) junction leakage, (ii) material volume, (iii) gate stack challenges, etc. Now we are tackling with Ge again. We have to understand merits and demerits of Ge, and to differentiate between intrinsic challenges and optimization issues. The mobility in bulk Ge is usually addressed as the big merit of Ge, however, there is a big discrepancy of the mobility between in the bulk and at the interface even in Si. To enjoy the merit, it is beyond question that the interface quality control is the key. Since interface issues will be discussed in another symposium, scaled device potential inherent in Ge is more focused.