[19p-P6-1~17] 6.4 Thin films and New materials

[19p-P6-1] Deposition of low-defects density and low-optical absorption fluoride coatings by Bombardment Deposition Source.

〇Masanori Kamioka¹, Kouji Sugawara¹, Akira Taniguchi¹, Tohru Takashima¹ (1.JEOL Ltd.)

Keywords:optical coating, fluoride, defect

Problems of bumping boiling, dissociation of evaporated particles and optical absorption of an optical film due to reflected electrons become latent in film formation of a fluoride evaporation material utilizing an electron beam evaporation source, and a countermeasure technique has been required. We recently developed a bombardment deposition source that employs an indirect heating method that uses an electron beam with excellent heat controllability and does not irradiate the vapor deposition material directly with an electron beam. We evaluated whether the bombardment deposition source could be a solution to the potential problems of the electron beam evaporation source, so we report below.