9:45 AM - 10:00 AM
[20a-B403-4] Metal Etching by Gas Cluster Ion Beams with Acetylacetone Vapor
Keywords:acetylacetone, GCIB, atomic layer etching
We had demonstrated halogen-free atomic layer etching (ALE) by gas cluster ion beam (GCIB) with acetic acid vapor. In this study, acetylacetone (acac) is used as background gas instead of acetic acid during GCIB irradiations. Etching effects for various metals and applications for halogen-free ALE by GCIB with acac are discussed.