[20a-C202-1~8] 17.3 Layered materials

▲ [20a-C202-1] [Young Scientist Presentation Award Speech] Growth of uniform hexagonal boron nitride film using chemical vapor deposition

〇Shengnan Wang¹, Alice Dearle¹, Hiroki Hibino^1,2, Kazuhide Kumakura¹ (1.NTT Basic Research Labs., 2.Kwansei Gakuin Univ.)

Keywords:hexagonal boron nitride, CVD

Here, we introduce a low pressure chemical vapor deposition method for large scale growth of hexagonal boron nitride (h-BN) film. By modifying gaseous species and mass transfer efficiency on the catalyst surface, multilayer growth of h-BN is suppressed, and h-BN film with high uniformity is achieved. The as-grown h-BN film is evaluated by topographic and electrical measurement for potential 2D nanoelectronics applications.