2018年第65回応用物理学会春季学術講演会

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17 ナノカーボン » 17.3 層状物質

[20a-C202-1~8] 17.3 層状物質

2018年3月20日(火) 10:00 〜 12:15 C202 (52-202)

北浦 良(名大)

10:00 〜 10:15

[20a-C202-1] [Young Scientist Presentation Award Speech] Growth of uniform hexagonal boron nitride film using chemical vapor deposition

Shengnan Wang1、Alice Dearle1、Hiroki Hibino1,2、Kazuhide Kumakura1 (1.NTT Basic Research Labs.、2.Kwansei Gakuin Univ.)

キーワード:hexagonal boron nitride, CVD

Here, we introduce a low pressure chemical vapor deposition method for large scale growth of hexagonal boron nitride (h-BN) film. By modifying gaseous species and mass transfer efficiency on the catalyst surface, multilayer growth of h-BN is suppressed, and h-BN film with high uniformity is achieved. The as-grown h-BN film is evaluated by topographic and electrical measurement for potential 2D nanoelectronics applications.