The 65h JSAP Spring Meeting, 2018

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-C204-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Tue. Mar 20, 2018 9:00 AM - 12:15 PM C204 (52-204)

Masanori Shinohara(Natl. Inst. of Tech.,Sasebo Col.)

11:45 AM - 12:00 PM

△ [20a-C204-11] Dependence of Microwave Hydrogen Plasma Treatement on S/Mo Ratio of MoS2 Film Grown by Chemical Vapor Deposition

〇Masahiro Sugiyama1, Yuta Nabuchi1, Akihisa Ogino1 (1.Shizuoka Univ.)

Keywords:microwave hydrogen plasma, molybdenum disulfide