2018年第65回応用物理学会春季学術講演会

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一般セッション(口頭講演)

9 応用物性 » 9.2 ナノワイヤ・ナノ粒子

[20a-F104-1~8] 9.2 ナノワイヤ・ナノ粒子

2018年3月20日(火) 09:30 〜 11:30 F104 (61-104)

深田 直樹(物材機構)

11:15 〜 11:30

[20a-F104-8] Controlling The Film Formation of Colloidal Quantum Dots Solids for Electronics Devices Applications

〇(M2)Ricky Dwi Septianto1,2、Satria Zulkarnaen Bisri1、Liming Liu1,3、Yasuhiro Ishida1、Takuzo Aida1,3、Loredana Protesescu4、Maksym Kovalenko4、Ferry Iskandar2、Yoshihiro Iwasa1,5 (1.RIKEN CEMS、2.Dept. Physics, Inst. Teknologi Bandung, Indonesia、3.Dept. Chemistry & Biotechnology, Univ. of Tokyo、4.Dept. Chemistry & Applied Biosciences, ETH Zurich & EMPA, Switzerland、5.QPEC & Dept. of Applied Physics, Univ.Tokyo)

キーワード:Colloidal quantum dots, superlattice, electonics devices

The colloidal quantum dot (QD) solids has become a great research attention in the last decade due to their unique size-dependent properties thus make them suitable for many application such as sensors, photovoltaics, optoelectronic devices, and thermoelectric devices. Furthermore, in the QD solids system, controlling the interaction and connection among individual QDs is very crucial to make such devices work. Herein, we focus on producing large-area of highly-ordered assembly QDs under the existence of ligand-exchange by several methods of film deposition. In several aspects, dip-coating method and liquid-air interfacial assembly method promote better ways to achieve superlattice of QDs in a large scale. The enhancement of electrical transport as the impact of the superlattice assembly quality is demonstrated.