[20p-C301-1~13] 3.11 Photonic structures and phenomena

[20p-C301-7] Photonic crystal demultiplexer fabricated with photolithography and its optimization

〇Shengji Jin¹, Yuta Ooka¹, Tomohiro Tetsumoto¹, Binti Daud Nurul Ashikin¹, Takasumi Tanabe¹ (1.Keio Univ.)

Keywords:photonic crystal, photolithography, demultiplexer

We will present Demultiplexer (DeMUX) based on photonic crystal nanocavities. Although air-bridged photonic crystal nanocavities have been fabricated by using electron-beam lithography, they are not suited for future mass production. In this paper, we fabricated silica clad DeMUX by using photo-lithography fabrication technology. The optical properties of the fabricated in-plane integrated eight channel DeMUX will be discussed. We will also discuss on the optimization of the position of the output waveguides in DeMUX, which will allow us to obtain lower loss and smaller crosstalk.