11:45 AM - 12:00 PM
△ [20a-E301-11] Influence of ALD Precursor on Electrical Properties of Al2O3/AlGaN/GaN MIS Structure
〇(M2)Masato Higashi1, Mutsunori Uenuma1, Koji Yoshitsugu2, Eiji Yagyu2, Yasuaki Ishikawa1, Yukiharu Uraoka1 (1.NAIST, 2.Mitsubishi Electric Corp.)