Akiko Hirata

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:00 AM - 10:30 AM

[18a-C309-5] [INVITED] Cyclic etching of tin-doped indium oxide using hydrogen-induced modified layer

〇Akiko Hirata¹, Masanaga Fukasawa¹, Kazunori Nagahata², Hu Li³, Kazuhiro Karahashi⁴, Satoshi Hamaguchi⁴, Tetsuya Tatsumi¹ (1.Sony Semiconductor Solutions Corporation, 2.Sony Semiconductor Manufacturing Corporation, 3.Tokyo Electron, 4.Osaka Univ.)

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