Satoshi Igarashi

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Speaker, Author, Co-Author

Thu. Sep 19, 2019 9:30 AM - 11:45 AM E308 (E308)

Oral presentation
| 17 Nanocarbon Technology
| 17.3 Layered materials

[19a-E308-1~9] 17.3 Layered materials

11:30 AM - 11:45 AM

[19a-E308-9] Reduction of Contact Resistance between TiSi₂ and Sputtered-MoS₂ Films by FG anneal

〇Satoshi Igarashi¹, Yusuke Mochizuki¹, Haruki Tanigawa¹, Masaya Hamada¹, Kentaro Matsuura¹, Kuniyuki Kakushima¹, Kazuo Tsutsui¹, Hitoshi Wakabayashi¹ (1.Tokyo Tech)