Naoya Okada

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 4:15 PM E304 (E304)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-E304-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

4:00 PM - 4:15 PM

[18p-E304-10] Low Schottky barrier height and high thermal stability of Co/n-Si junctions inserting WSi_n

〇Naoya Okada¹, Noriyuki Uchida¹, Shinichi Ogawa¹, Toshihiko Kanayama¹ (1.AIST)