Haruo Sudo

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C212 (C212)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal characterization, impurities and crystal defects

[18a-C212-1~11] 15.7 Crystal characterization, impurities and crystal defects

10:30 AM - 10:45 AM

[18a-C212-6] Formation of vacancy and oxygen complexes in Si wafers by ultra-high temperature RTP

〇Haruo Sudo^1,2, Koji Sueoka³ (1.GlobalWafers Japan, 2.Graduate School of Computer Science and Systems Eng., Okayama Pref. Univ., 3.Faculty of Computer Science and Systems Eng., Okayama Pref. Univ.)

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