Koichi Muro

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 4:00 PM - 6:00 PM PA5 (PA)

Poster presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[18p-PA5-1~22] 6.4 Thin films and New materials

4:00 PM - 6:00 PM

[18p-PA5-12] Fabrication of HfO₂ film by reactive evaporation method and antireflection coat for UV

〇Koichi Muro¹, Masayuki Sakai¹ (1.Asahi Spectra Co., Ltd.)