2:15 PM - 2:30 PM
[19p-E305-3] Effect of process conditions on properties of an OER- CVD SiO2 film at room temperature
〇Takayuki Hagiwara1, Naoto Kameda1, Toshinori Miura1, Yoshiki Morikawa1, Mitsuru Kekura1, Ryoji Kosugi2, Ken Nakamura2, Hidehiko Nonaka2 (1.Meidensha Corp., 2.AIST)